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The vertical oxidation LPCVD furnace system is used in fields such as IC integrated circuits, MEMS, power devices, nanodevices, optoelectronic devices, etc., for the oxidation, alloying, annealing and other processes of 6 "and 8" wafers.
Horizontal oxidation diffusion furnace and LPCVD system are applied in fields such as IC integrated circuits, MEMS, power devices, power electronic devices, optoelectronic devices, nanodevices, solar cells, etc.
The vertical oxidation LPCVD furnace system is used in fields such as IC integrated circuits, MEMS, power devices, nanodevices, optoelectronic devices, etc., for the oxidation, alloying, annealing and other processes of 6 "and 8" wafers.
Vertical LPCVD systems are used in fields such as IC integrated circuits, MEMS, power devices, nanodevices, optoelectronic devices, etc., and in processes such as thin film deposition and doping on 12 "wafers.
Used in fields such as IC integrated circuits, MEMS, power devices, nanotechnology, optoelectronic devices, etc.
The research type small batch oxidation diffusion LPCVD furnace is used in fields such as IC integrated circuits, MEMS, power devices, power electronic devices, nanodevices, optoelectronic devices, etc. It involves diffusion, oxidation, alloying, annealing, thin film deposition (LPCVD/PECVD), and doping of 2 "/4"/6 "/8"/12 "wafers.
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