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Rapid annealing RTP

Performance:

◆Hot wall dual chamber/halogen tungsten lamp heating/induction heating

◆Structural method: horizontal/vertical

◆Temperature:200~1200℃/

Supporting process:

◆Rapid annealing, alloying(RTA/RTP)

◆Rapid oxidation and nitriding(RTO/RTN)

◆Rapid Vapor Deposition (RTCVD), etc

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