30 Years Of Experience

华旗科技LOGO

✕
Products&Services
Home > Products&Services > Semiconductor Process Equipmen > Oxidative diffusion LPCVD furnace

12 "oxidation LPCVD furnace (production type)

Equipment inquiry

product details

+ Product Introduction Similar recommendations

Performance：

 ◆Vertical structure, efficient production capacity, 100-125 pieces/batch

 ◆Stable and excellent film-forming uniformity, with good repeatability

 ◆A high-precision and reliable automatic pressure control system

 ◆Advanced Technology for Low Oxygen Control in Microenvironments

 ◆Stable control of silicon wafer particle size, international standard

 ◆Fully automated process, AGV/OTH docking

 ◆High integration, complete factory MES system integration

 ◆Complies with standards such as SECS II/HSMS/GEM

 Supporting process：

 ◆Oxidation (dry and wet oxygen), annealing (N2, H2, rapid annealing)

 ◆Polycrystalline silicon P-Si, silicon nitride Si3N4, silicon oxide SiO2

 ◆Phosphorus silicon glass PSG, boron phosphorus silicon glass BPSG

 ◆TEOS，LTO，HTO，SIPOS...


Similar recommendations

Product sharing
Return to List

RELATED NEWS

Excellent Scientific Research.Design.Manufacture.Service Team

Putting customers first, employees first, quality first, innovation as the soul, strict love and mutual assistance within and outside the circle

Online consultation
Add WeChat Making phone calls

Qingdao Huaqi Technology Co., Ltd.

Address: West Airport Industrial Park, Shuangyuan Road, Chengyang District, Qingdao City

TEL：4008-110044

E-mail：huaqitech@163.com

微信公众号

WeChat

All Rights ©2023 Qingdao Huaqi Technology Co., Ltd鲁ICP备18050447号-1

Website Map

WeChat

Telephone
4008-110044

Message

MESSAGE

Please leave your contact information so that we can resolve your issue as soon as possible